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Latest News
Multichamber MBE system used to deposit thin magnetic structures via molecular beam epitaxy. Includes in-situ characterisation techniques for magnetic properties and crystal and surface structure studies.
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Multichamber analytical system designed for X-ray photoelectron spectroscopy(XPS), ultraviolet photoelectron spectroscopy (UPS) and angle-resolved photoemission spectroscopy (ARPES).
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Analytical chamber designed for X-ray photoelectron spectroscopy (XPS), integrated with multichamber vacuum system for thin film deposition.
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High-temperature system
for investigation of interactions between liquid metals, alloys and refractory materials under non isothermal conditions.
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 The Vacuum Gauge MG12-8CH is a versatile, microprocessor controlled device, that is able to support the operation of 8 vacuum gauges simultaneously. Device handles almost every gauge type on market, that are based on 0-10V or 4-20mA DC standard.
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The UHV System PV116 system is versatile R&D tool offering the flexibility of multi-deposition techniques in a single platform. It is configured to allow fast and simple change between multi-target sputtering or multi-source evaporation with a guaranteed base pressure in the 10-8 mbar range.
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 The UHV System PV128 magnetron sputtering system is dedicated to accurate and reproducible thin film layer deposition. It is configured to allow sputtering from both magnetic and non-magnetic target materials alike. The deposition process is fully programmable via dedicated PC software and PLC controller .
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The 6 Axes Manipulator is a high precision, high rigidity, UHV specimen manipulator of modular construction, suitable for a range of X, Y and Z linear motions and R1, R2 and R3 rotations. The modular construction means that the specification can be upgraded or modified by the addition or replacement of well defined modules.
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